Numerical Analysis of Gate Stacks
نویسندگان
چکیده
Numerous technological innovations, including material and process changes such as high–k gate dielectrics and metal gate electrodes, are investigated to meet the upcoming scaling requirements while keeping the gate leakage current within tolerable limits [1]. To overcome the technological problems, further theoretical and experimental research is needed which requires an extensive use of computer simulation. We present a software tool, the Vienna Schrödinger Poisson solver (VSP), for numerical analysis of novel gate stacks with emphasis on reliability.
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تاریخ انتشار 2006